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Perturbation analysis on large band gap bowing of dilute nitride semiconductors

机译:稀氮化物大带隙弯曲的微扰分析   半导体

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摘要

Contrary to the conventional empirical law, band gap of dilute nitridesemiconductors decreases with nitrogen concentration. In spite of a number of investigations, origin of this "large band gapbowing", is still under debate. In order to elucidate this phenomenon, weinvestigate change of band edge energies of GaN$_x$As$_{1-x}$ due to nitrogenby using the perturbation theory. It is found that energy shift of conductionband edge is arising from mixing between $\Gamma$- and L-states and/or$\Gamma$- and X-states induced by displacement of Ga atoms around N. We alsofound that the valence band edge state shows upward shift in spite of negativepotential of nitrogen. These results are well understood from character of thewavefunctions and symmetry of the perturbation potential.
机译:与传统的经验定律相反,稀氮化物半导体的带隙随氮浓度的增加而减小。尽管进行了许多调查,但这种“大范围飞跃”的起源仍在争论中。为了阐明这种现象,我们使用微扰理论研究了由于氮引起的GaN $ _x $ As $ _ {1-x} $的能带边能量的变化。发现导带边缘的能量移动是由于Ga原子在N周围位移引起的$ \ Gamma $和L状态和/或$ \ Gamma $和X状态之间的混合引起的。我们还发现价带尽管氮为负电势,但边缘状态仍显示向上移动。从波函数的特征和微扰电势的对称性可以很好地理解这些结果。

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